Boekhandel Douwes Den Haag

Science, Technology, and Management

High-k Materials in Multi-Gate FET Devices

High-k Materials in Multi-Gate FET Devices

Science, Technology, and Management

High-k Materials in Multi-Gate FET Devices

Science, Technology, and Management: High-k Materials in Multi-Gate FET Devices

 

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies.


Levertijd: 5 tot 8 werkdagen

€ 168,00

Levertijd: 5 tot 8 werkdagen


Beschrijving Science, Technology, and Management: High-k Materials in Multi-Gate FET Devices

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level.




  • Provides basic knowledge about FET devices



  • Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies



  • Discusses fabrication and characterization of high-k materials



  • Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures



  • Offers detailed application of high-k materials for advanced FET devices



  • Considers future research directions


This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.


ISBN
9780367639686
Pagina's
164
Verschenen
Serie
Science, Technology, and Management
NUR
950
Druk
1
Uitvoering
Hardback
Taal
Engels
Uitgever
Taylor & Francis Ltd

Technische wetenschappen